发明名称 OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD
摘要 An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element (21) for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator (22) located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A beam bundle of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
申请公布号 EP1720199(A1) 申请公布日期 2006.11.08
申请号 EP20050703645 申请日期 2005.01.14
申请人 NIKON CORPORATION 发明人 OMURA, YASUHIRO
分类号 H01L21/027;G02B13/14;G02B13/24;G02B17/08;G02B27/28;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址