发明名称 |
OPTICAL SYSTEM, EXPOSURE SYSTEM, AND EXPOSURE METHOD |
摘要 |
An optical system is able to achieve a substantially azimuthal polarization state in a lens aperture while suppressing loss of light quantity, based on a simple configuration. The optical system of the present invention is provided with a birefringent element (21) for achieving a substantially circumferential distribution or a substantially radial distribution as a fast axis distribution in a lens aperture, and an optical rotator (22) located behind the birefringent element and adapted to rotate a polarization state in the lens aperture. The birefringent element has an optically transparent member which is made of a uniaxial crystal material and a crystallographic axis of which is arranged substantially in parallel with an optical axis of the optical system. A beam bundle of substantially spherical waves in a substantially circular polarization state is incident to the optically transparent member.
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申请公布号 |
EP1720199(A1) |
申请公布日期 |
2006.11.08 |
申请号 |
EP20050703645 |
申请日期 |
2005.01.14 |
申请人 |
NIKON CORPORATION |
发明人 |
OMURA, YASUHIRO |
分类号 |
H01L21/027;G02B13/14;G02B13/24;G02B17/08;G02B27/28;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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