| 摘要 |
<p>A method for removing a photoresist layer from a substrate is provided to reduce the usage of a sulfuric acid, to economize photoresist removing costs, and to improve photoresist removing efficiency. A strip solution is sprayed onto a substrate in order to dissolve a photoresist layer of the substrate, wherein the substrate is spinning in a first speed range(S10). A chemical reaction of the strip solution on the photoresist layer is promoted by spinning slowly the substrate(S20). A rinse solution is sprayed onto the substrate, wherein the substrate is spinning in a second speed range(S30). A drying process is performed on the substrate by spinning quickly the substrate(S40).</p> |
