| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoresist development nozzle by which a uniform development can be carried out even when a wafer is of a large diameter, and a photoresist development apparatus. SOLUTION: The photoresist development apparatus is equipped with a nozzle body in which a developer passes inside, a developer supply tubing to supply the developer to the nozzle body, a developer discharge portion which is located in the nozzle body and discharges the developer supplied from the developer supply tubing to the wafer, and a developer agitating means to agitates the developer inside the nozzle body. The developer agitating means includes an electrostrictive element forming at least a part of the wall surface of the nozzle body and an alternating current apply means to apply alternating current to the electrostrictive element. COPYRIGHT: (C)2004,JPO |
