| 摘要 |
It is intended to provide polymers useful in resists and the like for forming fine patterns with a high sensitivity and a high resolution by increasing the difference in the solubilities between exposed parts and unexposed parts. The invention concerns a polymer having a repeating unit represented by the following general formula (I):
wherein R 1 and R 2 independently represent hydrogen atom, halogen atom, C 1-20 hydrocarbon group, a heterocyclic group, a cyano group, a nitro group, C(=O)R 4 group, S(O) n R 4 group, P(=O)(R 4 ) 2 group or M(R 4 ) 3 group; R 3 represents C 1-20 hydrocarbon group or a heterocyclic group: R 4 represents C 1-20 hydrocarbonoxy group, C 1-20 hydrocarbon group, C 1-20 hydrocarbonthio group or mono- or di- C 1-20 hydrocarbonamino group; M represents a silicon, germanium, tin or lead atom; and n is 0, 1 or 2.
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