发明名称 |
HEAT TREATMENT APPARATUS OF LIGHT EMISSION TYPE |
摘要 |
A heat treatment apparatus of a light emission type is provided to improve uniformity of temperature distribution in a substrate during a heat treatment by employing a maintain unit and a light emitting unit. A chamber(6) comprises a chamber side unit(63) having a cylindrical inner wall and a chamber bottom unit(62) covering a bottom of the chamber side unit. A thermal processing space(65) is enclosed by the chamber side unit and the chamber bottom unit. An upper hole(60) is formed on the thermal processing space. A photo conductive plate(61) is mounted to the upper hole as a sealing member to seal the upper hole. A maintain unit(7) preliminarily heats a semiconductor layer(W) during maintaining the semiconductor layer in the chamber. A maintain unit elevating apparatus(4) moves the maintain unit up and down against the chamber bottom unit. A light emitting unit(5) emits a light to the semiconductor layer maintained by the maintain unit through the photo conductive plate.
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申请公布号 |
KR20060114657(A) |
申请公布日期 |
2006.11.07 |
申请号 |
KR20060039619 |
申请日期 |
2006.05.02 |
申请人 |
DAINIPPON SCREEN MFG. CO., LTD. |
发明人 |
ITO YOSHIO |
分类号 |
H01L21/324 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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