发明名称 HEAT TREATMENT APPARATUS OF LIGHT EMISSION TYPE
摘要 A heat treatment apparatus of a light emission type is provided to improve uniformity of temperature distribution in a substrate during a heat treatment by employing a maintain unit and a light emitting unit. A chamber(6) comprises a chamber side unit(63) having a cylindrical inner wall and a chamber bottom unit(62) covering a bottom of the chamber side unit. A thermal processing space(65) is enclosed by the chamber side unit and the chamber bottom unit. An upper hole(60) is formed on the thermal processing space. A photo conductive plate(61) is mounted to the upper hole as a sealing member to seal the upper hole. A maintain unit(7) preliminarily heats a semiconductor layer(W) during maintaining the semiconductor layer in the chamber. A maintain unit elevating apparatus(4) moves the maintain unit up and down against the chamber bottom unit. A light emitting unit(5) emits a light to the semiconductor layer maintained by the maintain unit through the photo conductive plate.
申请公布号 KR20060114657(A) 申请公布日期 2006.11.07
申请号 KR20060039619 申请日期 2006.05.02
申请人 DAINIPPON SCREEN MFG. CO., LTD. 发明人 ITO YOSHIO
分类号 H01L21/324 主分类号 H01L21/324
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