发明名称 Chemically amplified positive resist composition
摘要 The present invention provide a chemically amplified positive resist composition comprising a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound of the formula (C-1) wherein R<SUP>1 </SUP>and R<SUP>2 </SUP>each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R<SUP>3</SUP>, R<SUP>4 </SUP>and R<SUP>5 </SUP>each independently represents a hydrogen or a hydroxyl.
申请公布号 US7132218(B2) 申请公布日期 2006.11.07
申请号 US20050082835 申请日期 2005.03.18
申请人 SUMITOMO CHEMICAL COMPANY, LIMITED 发明人 TOISHI KOUJI;TAKATA YOSHIYUKI;YAMAGUCHI SATOSHI
分类号 G03F7/004;C23F1/00;G03C1/76;G03F7/039 主分类号 G03F7/004
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