发明名称 |
Chemically amplified positive resist composition |
摘要 |
The present invention provide a chemically amplified positive resist composition comprising a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound of the formula (C-1) wherein R<SUP>1 </SUP>and R<SUP>2 </SUP>each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R<SUP>3</SUP>, R<SUP>4 </SUP>and R<SUP>5 </SUP>each independently represents a hydrogen or a hydroxyl.
|
申请公布号 |
US7132218(B2) |
申请公布日期 |
2006.11.07 |
申请号 |
US20050082835 |
申请日期 |
2005.03.18 |
申请人 |
SUMITOMO CHEMICAL COMPANY, LIMITED |
发明人 |
TOISHI KOUJI;TAKATA YOSHIYUKI;YAMAGUCHI SATOSHI |
分类号 |
G03F7/004;C23F1/00;G03C1/76;G03F7/039 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|