发明名称 Method of forming a layered polishing pad
摘要 A method of forming a layered polishing pad is disclosed. The method includes double-laminating a subpad on opposing sides with respective adhesive layers and bonding a polishing pad top layer to the subpad via the upper adhesive layer. The polishing pad optionally includes a window. Because the subpad is double-laminated, an opening can be formed through both the top and bottom adhesive layers as well as the subpad. Thus, when bonded to a top polishing pad layer having a window, the result is a layered polishing pad with a through optical path that does not include an adhesive layer.
申请公布号 US7132033(B2) 申请公布日期 2006.11.07
申请号 US20040788951 申请日期 2004.02.27
申请人 ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. 发明人 BOLDIZAR MARK J.;GAMBLE ROBERT T.;HEDRICK VINCENT MATTHEW;LAWHORN JASON M.;SAIKIN ALAN H.;TOME KATHERINE L.
分类号 B24B37/00;B32B37/02;B24B37/04;B24B49/12;B24D7/12;B24D18/00;B32B37/12;B32B38/04;B32B38/10;B32B38/18;H01L21/304 主分类号 B24B37/00
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