发明名称 Lithographic apparatus and device manufacturing method
摘要 In a scanning immersion lithographic apparatus, immersion liquid is supplied on one side of the space between the projection system and the substrate and drained on the other side so that the flow of liquid is substantially perpendicular to the scan direction.
申请公布号 US7133114(B2) 申请公布日期 2006.11.07
申请号 US20040944415 申请日期 2004.09.20
申请人 ASML NETHERLANDS B.V. 发明人 HOOGENDAM CHRISTIAAN ALEXANDER;TEN KATE NICOLAAS;VAN DER MEULEN FRITS;JACOBS JOHANNES HENRICUS WILHELMUS
分类号 G03B27/52 主分类号 G03B27/52
代理机构 代理人
主权项
地址