| 摘要 |
A liquid crystal photo-mask useful for LC photo-mask apparatus, pattern formation and flat display fabrication processes are provided to simply alter shade pattern forms by adapting the photo-mask to determine whether light passes through a liquid crystal layer in the photo-mask according to molecular array in the liquid crystal layer, thereby easily patterning in semiconductor devices such as PDP. The photo-mask comprises: lower and upper substrates(11,10) opposite to each other at constant interval; a plurality of lower and upper electrodes(16,15) which are mounted on inner sides of the both substrates opposite to each other to form a number of pixels by the mutually opposed areas; liquid crystal layer which is aligned in the pixel areas, has optical anisotropy and molecular alignment changed according to direction of electric field when voltage is applied; and lower and upper polar plates(14,13) which are installed on outer sides of the lower and upper substrates, respectively, and arranged to selectively polarize light in directions perpendicular to each other.
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