Photolithography device`s optical system, has aberration correction units with refractive power higher than refractive power of mirror, and support units extended according to axis parallel to optical axis of system

摘要

The system has a mirror (10) and support units (31, 32) for receiving and maintaining a mask (M) and a plate (W), where the support units are extended according to an axis parallel to an optical axis of the system. Aberration correction units (11, 41-45) are optically located between the support units and the mirror, where the correction units have a refractive power higher than the refractive power of the mirror.