| 摘要 |
A substrate processing apparatus is provided to remove effectively an organic material or particles without the damage of a substrate pattern by spraying a high temperature steam under a high pressure condition using a steam spraying unit. A substrate processing apparatus comprises a cleaning chamber(11), a substrate transfer unit for transferring a substrate, a steam generating unit(1) for generating a predetermined steam, a valve(5) for controlling the amount of the predetermined steam, a steam spraying unit, and an exhaust unit. The steam spraying unit(7) is connected with the valve through a pipeline. The steam spraying unit is used for spraying the predetermined steam onto the substrate in the cleaning chamber. The exhaust unit is used for exhausting the predetermined steam from the cleaning chamber.
|
