TOP ANTI-REFLECTIVE COATING COMPOSITION AND METHOD FOR PATTERN FORMATION OF SEMICONDUCTOR DEVICE USING THE SAME,申请号KR20040069044-传众专利搜索

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发明名称	TOP ANTI-REFLECTIVE COATING COMPOSITION AND METHOD FOR PATTERN FORMATION OF SEMICONDUCTOR DEVICE USING THE SAME
摘要
申请公布号	KR100642416(B1)	申请公布日期	2006.11.03
申请号	KR20040069044	申请日期	2004.08.31
申请人		发明人
分类号	G03F7/004	主分类号	G03F7/004
代理机构		代理人
主权项
地址

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