Wafer polishing pad and Method of manufacturing the same,申请号KR19990065175-传众专利搜索

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发明名称	Wafer polishing pad and Method of manufacturing the same
摘要
申请公布号	KR100642423(B1)	申请公布日期	2006.11.03
申请号	KR19990065175	申请日期	1999.12.29
申请人		发明人
分类号	H01L21/304	主分类号	H01L21/304
代理机构		代理人
主权项
地址

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