| 发明名称 |
PROCESS OF SURFACE TREATMENT, SURFACE TREATING DEVICE, SURFACE TREATED PLATE, AND ELECTRO-OPTIC DEVICE, AND ELECTRONIC EQUIPMENT |
| 摘要 |
A process of providing a hydrophobic property to the surface of a plate, and a process of providing a hydrophilic property to the surface by irradiating energy light (radiation) on the surface of the plate, which is provided with the hydrophobic property are provided Variations in the accumulated illumination intensity of radiation on the surface of the plate are controlled to 20% or less.
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| 申请公布号 |
US2006244886(A1) |
申请公布日期 |
2006.11.02 |
| 申请号 |
US20060426453 |
申请日期 |
2006.06.26 |
| 申请人 |
SEIKO EPSON CORPORATION |
发明人 |
HIRAI TOSHIMITSU;HASEI HIRONORI |
| 分类号 |
G02F1/1333;G02F1/1343;B05D3/06;G01N13/02;G06K19/077;H01J9/20;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;H05K3/10;H05K3/12;H05K3/38 |
主分类号 |
G02F1/1333 |
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