发明名称 SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 <p>A field effect transistor for nonvolatile memory holding use and a field effect transistor for logical operation use are manufactured in a same structure on a same semiconductor substrate without separately providing manufacturing processes for the field effect transistors for the two uses. Both of a memory circuit and a logic circuit of a semiconductor integrated circuit are composed of n and p channel field effect transistors including a memory holding material in a gate insulating structure (12). A logical operation status, a memory writing status and a nonvolatile memory holding status are electrically switched by controlling the level and applying timing of a voltage to be applied between a gate and a substrate region of the n and p channel field effect transistors including the memory holding material in the gate insulating structure.</p>
申请公布号 WO2006115075(A1) 申请公布日期 2006.11.02
申请号 WO2006JP307850 申请日期 2006.04.13
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY;TAKAHASHI, MITSUE;SAKAI, SHIGEKI 发明人 TAKAHASHI, MITSUE;SAKAI, SHIGEKI
分类号 H01L21/8246;G11C11/22;H01L27/10;H01L27/105;H03K19/0944;H03K19/20 主分类号 H01L21/8246
代理机构 代理人
主权项
地址