GUIDE RING FOR POLISHING RECTANGULAR SUBSTRATE, POLISHING HEAD, AND METHOD FOR POLISHING RECTANGULAR SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a guide ring capable of finishing a rectangular substrate to the rectangular substrate easily and surely having high flatness when polishing the rectangular substrate such as a photomask substrate.

SOLUTION: When polishing the rectangular substrate 6, while pressing the rectangular substrate 6 against polishing cloth 13, this guide ring 1 prevents excessive polishing for the surrounding part of the substrate 6 by pressing the polishing cloth around the substrate 6. In the guide ring 1, a storing part 2 for storing the substrate 6 is provided and a part 4a having a clearance with the substrate 6 larger than other parts is formed in a part around the storing part 2 on a surface on a side in contact with the polishing cloth 13.

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