| 摘要 |
A substrate processing system including a processing section for processing a substrate; a carry-in/out section for carrying in/out the substrate; and a load lock section provided between the processing section and the carry-in/out section, is characterized in that the load lock section includes a first load lock apparatus including a carry-in port provided on a side of the carry-in/out section for carrying in/out the substrate, a carry-out port provided on a side of the processing section for processing the substrate, and supporting members for supporting the substrate; and a second load lock apparatus including a carry-out port provided on the carry-in/out section side, a carry-in port provided on the processing section side, and supporting members for supporting the substrate, that the second load lock apparatus includes a first cooling plate and a second cooling plate each for cooling the substrate supported on the supporting members, and that one of the first cooling plate and the second cooling plate is located on a front surface side of the substrate and another is located on a rear surface side of the substrate.
|
