| 发明名称 |
METHOD FOR CONTROLLING POLISHING FLUID DISTRIBUTION |
| 摘要 |
A method for delivering a polishing fluid to a chemical mechanical polishing surface is provided. In one embodiment, a method for delivering a polishing fluid to a polishing surface of a chemical mechanical polisher includes flowing polishing fluid to a first portion of the polishing surface through a first outlet while a second portion of the polishing surface adjacent a second outlet receives no flow of polishing fluid, and flowing polishing fluid through the second outlet to the second portion of the polishing surface.
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| 申请公布号 |
US2006246821(A1) |
申请公布日期 |
2006.11.02 |
| 申请号 |
US20060456674 |
申请日期 |
2006.07.11 |
| 申请人 |
VEREEN LIDIA;SKARPELOS PETER N;DOWNUM BRIAN J;WILLIAMS PATRICK;KO TERRY K;LEE CHRISTOPHER H;REYNOLDS KENNETH R;HEARNE JOHN;HACHNOCHI DANIEL |
发明人 |
VEREEN LIDIA;SKARPELOS PETER N.;DOWNUM BRIAN J.;WILLIAMS PATRICK;KO TERRY K.;LEE CHRISTOPHER H.;REYNOLDS KENNETH R.;HEARNE JOHN;HACHNOCHI DANIEL |
| 分类号 |
B24B51/00;B24B7/30;B24B37/04;B24B57/02;B24C1/00 |
主分类号 |
B24B51/00 |
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