| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist undercoat film material for a multilayer resist process, in particular, a two-layer resist process or a three-layer resist process, which has a function of neutralizing an amine-based contaminant from a substrate to reduce adverse influences such as trailing of a resist pattern in an overcoat resist, and to provide a method for forming a pattern on a substrate by using the material. <P>SOLUTION: The resist undercoat film material for the multilayer resist film to be used in lithography contains at least a polymer having a repeating unit expressed by general formula (1) as an acid generator. <P>COPYRIGHT: (C)2007,JPO&INPIT |
