REACTION DEVELOPMENT IMAGE FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To obtain a positive or negative photoresist as desired.

SOLUTION: It is made possible to obtain a positive or negative type photoresist as desired by changing a developer solution properly and using polylactic acid system resin as a polymer. This invention is a development image forming method that forms a photoresist layer consisting of polylactic acid-based resin and a photo-acid generator on a substrate, and masks it with a desired pattern to irradiate with ultraviolet rays, then washes off this layer with a developer. This reaction development image forming method uses a polylactic acid-based resin consisting of a polyester copolymer containing 50% in weight or more of polylactic acid or L-lactic and/or D-lactic acid as the monomer and a developer which is a solution containing amine or a solution containing alkoxide and a polar solvent.

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