| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide new technique for calibrating an internal illuminometer during water-dip exposure. <P>SOLUTION: An exposure device projects the pattern of an original plate on a substrate in a liquid-dip state wherein the space between the substrate and an optical member facing the substrate is filled with liquid. The device includes a projection optical system for projecting the pattern of the original plate on the substrate; a first light quantity detecting means for detecting the quantity of light passed through the projection optical system; and a first calibrating means for calibrating the first light quantity detecting means based upon outputs of the first light quantity detecting means when the space is filled with the liquid, and when the space is not filled with the liquid and the output of an externally carried-in second light quantity detecting means for detecting the quantity of light passed through the projection optical system when the space is not filled with the liquid. <P>COPYRIGHT: (C)2007,JPO&INPIT |
