| 摘要 |
PROBLEM TO BE SOLVED: To provide an inspection apparatus and an inspection method for achieving precise and high-throughput defect detection performance, in a wide range of defect sizes from a small defect to a large one. SOLUTION: The SEM-type inspection apparatus for repeatedly scanning a sample with electron beams, generating inspection images and reference images based on secondary electrons or reflection electrons generated from the sample, and obtaining a defective section from the differential image has a function for varying the number of pixels in the repeated scanning direction of the electron beams in the images generated. COPYRIGHT: (C)2007,JPO&INPIT
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