发明名称 Raster Frame Beam System For Electron Beam Lithography
摘要 A method for writing a master image on a substrate includes dividing the master image into a matrix of frames, each frame including an array of pixels defining a respective frame image in a respective frame position within the master image. An electron beam is scanned in a raster pattern over the substrate, while shaping the electron beam responsively to the respective frame image of each of the frames as the electron beam is scanned over the respective frame position, so that in each frame, the electron beam simultaneously writes a multiplicity of the pixels onto the substrate.
申请公布号 US2006243918(A1) 申请公布日期 2006.11.02
申请号 US20060458043 申请日期 2006.07.17
申请人 ALONI MEIR;FRIEDMAN MULA;VISHNIPOLSKY JIMMY;ALMOGY GILAD;LITMAN ALON;LEHMAN YONATAN;MESHULACH DORON;TIROSH EHUD 发明人 ALONI MEIR;FRIEDMAN MULA;VISHNIPOLSKY JIMMY;ALMOGY GILAD;LITMAN ALON;LEHMAN YONATAN;MESHULACH DORON;TIROSH EHUD
分类号 A61N5/00;G03F7/20 主分类号 A61N5/00
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