| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition for pattern formation by the use of actinic rays or radiation, the composition ensuring that the sensitivity, resolution and pattern profile are good, the line edge roughness is small and the surface roughness is satisfied, and further improved in outgas property, dissolution contrast and temperature dependency of PEB (post exposure bake), and to provide a pattern forming method using the above composition. <P>SOLUTION: The positive resist composition comprises (A) a compound which generates an acid upon irradiation with actinic rays or radiation, and (B) a resin which has a specified repeating unit and the solubility of which in an alkali developing solution increases under the action of an acid. The method for forming a pattern is carried out by using the composition. <P>COPYRIGHT: (C)2007,JPO&INPIT |
