| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having no problem with safety, excellent in sensitivity, resolution and storage stability, having good development margin, capable of forming an interlayer insulation film having excellent solvent resistance, heat resistance, light transmittance and adhesion, and capable of forming microlenses having excellent solvent resistance, heat resistance, light transmittance and adhesion, and also having a good melt shape. <P>SOLUTION: The radiation sensitive resin composition contains [A] an alkali-soluble copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound having an oxetane ring structure and (a3) an olefinically unsaturated compound other than the above components, [B] a 1,2-quinonediazido compound and [C] an antimony-free thermosensitive acid generating compound. <P>COPYRIGHT: (C)2007,JPO&INPIT |
