发明名称 |
GAS INLET ELEMENT FOR A CVD REACTOR |
摘要 |
The invention relates to a gas inlet element (2) for a CVD reactor with a chamber (4), which has a multitude of bottom-side outlet openings (23), via which a process gas introduced into the chamber (4) via edge-side access openings (10) exits into a process chamber (21) of the CVD reactor (1). In order to homogenize the gas composition, the invention provides that at least one mixing chamber arrangement (11, 12, 13) is situated upstream from the access openings (10), and at least two process gases are mixed with one another inside this mixing chamber arrangement. |
申请公布号 |
WO2006079576(A3) |
申请公布日期 |
2006.11.02 |
申请号 |
WO2006EP50048 |
申请日期 |
2006.01.05 |
申请人 |
AIXTRON AG;REINHOLD, MARKUS;BAUMANN, PETER |
发明人 |
REINHOLD, MARKUS;BAUMANN, PETER |
分类号 |
C23C16/455 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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