| 摘要 |
<p>A plasma doping apparatus (100) includes a chamber (104) and a plasma source (162) that generates ions in the chamber from a dopant gas. A grating (154) is positioned in the chamber. A platen (148) for supporting a target (150) is positioned in the chamber. At least one of the grating and the target are oriented so that dopant ions extracted from the grating impact the target at a non- normal angle of incidence.</p> |
