| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an accurate measurement system to measure a position of a substrate table or any other movable part of a lithographic apparatus or of any other positioning apparatus. <P>SOLUTION: A lithographic apparatus has a substrate table to hold a substrate, a reference structure and a measurement system to measure the position of the substrate table with respect to the reference structure. The measurement system has a first measurement system to measure the position of the substrate table with respect to an intermediate structure, and a second measurement system to measure the position of the intermediate structure with respect to the reference structure. The intermediate structure is connected or connectable to a drive mechanism to drive the substrate table. A distance between the substrate table and the intermediate structure and a distance between the intermediate structure and the reference structure are shortened, which leads to a highly accurate position measurement. <P>COPYRIGHT: (C)2007,JPO&INPIT |
