MANUFACTURING METHOD AND MANUFACTURING DEVICE OF SEMICONDUCTOR ELEMENT, AND SEMICONDUCTOR ELEMENT

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor element for forming an oxide layer as a constitutional element of a semiconductor element accurately, and to provide the semiconductor element and a manufacturing device thereof. SOLUTION: The manufacturing method of the semiconductor element includes an oxidation step for forming an oxide layer on a wafer 1 (semiconductor substrate) by using an oxide gas. The oxidation step is separated into two or more oxidation steps for one wafer 1. COPYRIGHT: (C)2007,JPO&INPIT