发明名称 Inspection method and inspection system using charged particle beam
摘要 In an electric immersion lens having high resolution capability, secondary electrons generated from a specimen are accelerated to suppress the dependency of rotational action of the secondary electrons applied thereto by an objective lens upon energy levels of the secondary electrons and when selectively detecting low and high angle components of elevation and azimuth as viewed from a secondary electron generation site by means of an annular detector interposed between an electron source and the objective lens, the secondary electrons are adjusted and deflected by means of an ExB deflector such that the center axis of secondary electrons converged finely under acceleration is made to be coincident with the center axis of a low elevation signal detection system and the secondary electrons are deviated from an aperture of a high elevation signal detection system.
申请公布号 US2006243906(A1) 申请公布日期 2006.11.02
申请号 US20060412976 申请日期 2006.04.28
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 FUKADA ATSUKO;SATO MITSUGU;SUZUKI NAOMASA;NISHIYAMA HIDETOSHI;FUKUDA MUNEYUKI;TAKAHASHI NORITSUGU
分类号 G01N23/00 主分类号 G01N23/00
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