| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an apparatus which employs a measuring method and a measuring device capable of reducing the aberration of a projection optical system, an exposure method using the same, and a device manufacturing method. <P>SOLUTION: The measuring method of an optical system to be used for an exposure apparatus includes an irradiation step wherein a prescribed amount of laser light is irradiated on the optical system, and a first measurement step wherein the optical performance of the optical system is measured during the irradiation of laser light. <P>COPYRIGHT: (C)2007,JPO&INPIT |
