| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a correction carrier structure capable of smoothing polishing surfaces of upper and lower platens with high accuracy by a simple structure. <P>SOLUTION: This correction carrier 1 for use in a both-surface polishing device includes the upper platen 2 and the lower platen 4 having the polishing surfaces 3, a carrier holding a plurality of works between them is meshed with a sun gear and an internal gear, and the sun gear and the internal gear are rotated to cause the planetary motion of the carrier, thereby polishing both surfaces of the work. The carrier includes: a disk plate 10 meshing with the sun gear and the internal gear; and a correcting part 12 integrally projected from both surfaces of the disk plate 10 toward polishing surface sides of the upper platen 2 and the lower platen 4 at a predetermined height, and disposed to be annular along the peripheral edge of the outer peripheral end of the disk plate 10 wherein the moving range of the correcting part 12 by the planetary motion of the disk plate 10 includes the polishing surface 3. <P>COPYRIGHT: (C)2007,JPO&INPIT |
