| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a defect correction method for pattern substrate and a defect correction device therefor for improving the productivity, and to provide a method of manufacturing the pattern substrate using the defect correction method for the pattern substrate. <P>SOLUTION: The defect correction device is provided with: a mask film reel 8 on which a mask film 5 to be arranged opposite to a substrate 6 is wound; transfer film loaders 21 which supply a piece of transfer film; and a repair head 35 movably disposed. Therein, a film holder 42 which holds the piece of the transfer film 18 and a laser beam source 1 which emits laser beam for forming an opening on the mask film 5 are disposed on the repair head 35, the repair head 35 is moved so that the film holder 42 is located at a position corresponding to the opening, the piece of the transfer film 18 is arranged above the opening disposed on the mask film 5 and the transfer layer of the transfer film 18 is transferred to the substrate via the opening of the mask film 5. <P>COPYRIGHT: (C)2007,JPO&INPIT</p> |
