发明名称 Method of inspecting a circuit pattern and inspecting instrument
摘要 An apparatus for inspecting a sample using a scanning electron microscope includes a sample stage, a first electron-optical system to scan an electron beam of a first beam current on the sample, a second electron-optical system to scan an electron beam of a second beam current smaller than the first beam current on the sample, a mechanism to move the sample stage, a detector provided in each of the first and second electron-optical systems to detect a secondary electron. The first electron-optical system is operable in a first mode and the second electron-optical system is operable in a second mode with higher resolution than that of the first mode. In the first mode, the sample is observed while the sample stage is moved continuously, and in the second mode, the sample is observed by detecting a secondary electron using the detector while the sample stage is held stationary.
申请公布号 US2006243908(A1) 申请公布日期 2006.11.02
申请号 US20060452989 申请日期 2006.06.15
申请人 发明人 SHINADA HIROYUKI;TAKAFUJI ATSUKO;NINOMIYA TAKANORI;SASAKI YUKO;NOZOE MARI;MURAKOSHI HISAYA;NINOMIYA TAKU;KASAI YUJI;MAKINO HIROSHI;KANEKO YUTAKA;TANIMOTO KENJI
分类号 G21K7/00 主分类号 G21K7/00
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