| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor manufacturing apparatus for making flow a solid-substance generating gas through a valve provided between a reactor chamber and an exhausting pump, and capable of preventing a solid film from being formed in a portion facing a gas flow passage in the valve. SOLUTION: In the semiconductor manufacturing apparatus in which a valve device comprising a fixed part such as a valve box 2 etc. and a movable part such as a valve body 9 etc. is provided between the reactor chamber and the exhausting pump, a heater 31 is fixed on the fixed part of the valve device and the valve device is attached to related equipment via a heat insulating member. COPYRIGHT: (C)2007,JPO&INPIT
|
