发明名称 IMPRINT LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide an imprint lithography apparatus which is small in size, has a high resolution, and is inexpensive. SOLUTION: The imprint lithography apparatus has a template holder 6 configured to hold an imprint template 1 and a substrate table 3. The template holder 6 has a gas bearing configured to supply gas via a high pressure channel 9, and to control the separation distance between the imprint template 1 and a substrate 2 held on the substrate table 3. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006303502(A) 申请公布日期 2006.11.02
申请号 JP20060114629 申请日期 2006.04.18
申请人 ASML NETHERLANDS BV 发明人 VAN SANTEN HELMAR;KOLESNYCHENKO ALEKSEY Y
分类号 H01L21/027;B82B3/00 主分类号 H01L21/027
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