发明名称 A METHOD FOR MEASURING THE POSITION OF A MARK IN A MICRO LITHOGRAPHIC DEFLECTOR SYSTEM
摘要 <p>The present invention relates to a method for determining the coordinates of an arbitrarily shaped pattern in a deflector system. The method basically comprises the steps of: moving the pattern in a first direction (X), calculating the position of the edge of the pattern by counting the number of micro sweeps, performed in a perpendicular direction (Y), until the edge is detected, determining a correction function for the surface reflecting variations in a third direction (Z) perpendicular to both the first (X) and the second (Y) directions, and determining the coordinates by relating the number of counted micro sweeps to the speed of the movement of the pattern using the correction function to compensate for variations in the third direction. The invention also relates to software implementing the method.</p>
申请公布号 WO2006115438(A1) 申请公布日期 2006.11.02
申请号 WO2005SE00591 申请日期 2005.04.25
申请人 MICRONIC LASER SYSTEMS AB;EKBERG, PETER 发明人 EKBERG, PETER
分类号 G03F9/00 主分类号 G03F9/00
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