发明名称 PLASMA TREATMENT DEVICE
摘要 <P>PROBLEM TO BE SOLVED: To provide a plasma treatment device which improves precision of a plasma treatment of an object and which is stand-alone. <P>SOLUTION: The plasma treatment device has a plasma irradiating unit which irradiates plasma on the surface of an object, a posture control unit 30 controlling a plasma irradiating posture of the plasma irradiating unit, position control units 10, 11, 51 controlling a plasma irradiating position on the surface of the object, a radical measuring unit 41 measuring a radical density irradiated by the plasma irradiating unit, and a first control unit 52 which, in accordance with the radical density measured by the radical measurement unit, controls a plasma generating volume of the plasma irradiating unit. <P>COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006302652(A) 申请公布日期 2006.11.02
申请号 JP20050122580 申请日期 2005.04.20
申请人 UNIV NAGOYA;NU ECO ENGINEERING KK;FUJI MACH MFG CO LTD 发明人 HORI MASARU;KANO HIROYUKI;YOSHIDA TADASHI
分类号 H05H1/24;C23C16/513;H01L21/304;H05H1/00 主分类号 H05H1/24
代理机构 代理人
主权项
地址