| 摘要 |
PROBLEM TO BE SOLVED: To provide a vaporizer for CVD which can accurately control the flow rate of a material solution for CVD over a long period, and to provide a solution vaporizing CVD apparatus and vaporization method for CVD thereof. SOLUTION: The vaporizer for CVD is provided with an orifice tube which distributes the material solution in a carrier gas in particle state or misty state, passages 21-25 for a material solution which supply the material solution to the portion connected to the gas passage of the orifice tube, a passage 33 for carrier gas which supplies the carrier gas to the orifice tube, a vaporizing tube 31 for vaporizing the material solution distributed by the orifice tube, and an ejecting part for ejecting the gas of the orifice tube inserted into the vaporizing tube 31. The orifice tube has a cylindrical gas passage. COPYRIGHT: (C)2007,JPO&INPIT
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