| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning apparatus wherein no drying marks of a cleaning liquid are left on the surface of substrates and the quantity of the cleaning liquid can be saved. SOLUTION: In the cleaning apparatus, a liquid film retaining member 12 is located between a washing tool 14 and air knives 2A, 2B, is opposite to a glass substrate 1 at an interval by a prescribed size, and retains liquid films 15 caused by the cleaning liquid 16 on the surfaces 1A, 1B of the substrate 1. Thus, the liquid film retaining member 12 prevents the cleaning liquid 16 from being polka-dottedly separated at the surface of the substrate 1A, 1B until the substrate 1 is carried from the washing tool 14 to the air knives 2A, 2B. Consequently, the substrate 1 is dried by the air knives 2A, 2B and thereafter, no drying marks are left on the surfaces of the substrate 1, and the surfaces of the substrate 1 can uniformly be dried to prevent deterioration in the surfaces of the substrate 1. COPYRIGHT: (C)2007,JPO&INPIT
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