| 摘要 |
PROBLEM TO BE SOLVED: To provide a composite apparatus for heat treatment and vapor deposition capable of continuously performing heat treatment and vapor deposition in which the temperature and the time can be accurately controlled for continuous heating at the high temperature of 1,200°C, and the cooling can be controlled in the same chamber in the atmospher of an inert gas or under vacuo. SOLUTION: The compound apparatus comprises: a shaft of a driving device, the shaft having a water-cooled structure, capable of performing horizontal translation, rotation and turn, and having a hole in a center part thereof for passing a thermocouple for measuring the temperature of a base material; a rotary thermocouple connection unit on the shaft end; and a rotary tool having a rotation-revolution axis in the same direction as the shaft or a rotation-revolution axis orthogonal to the shaft on a distal end of the spindle, wherein a water-cooled type base material observation window having a movable shaft to support the base material is attached to a chamber side wall opposing the side where a base material driving device is installed. COPYRIGHT: (C)2007,JPO&INPIT
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