发明名称 |
Micropattern forming material and method for forming micropattern |
摘要 |
A micropattern forming material is formed on a resist pattern containing an acidic group. The micropattern forming material comprises a compound that penetrates the resist pattern. The penetration of the compound causes the resist pattern to form a crosslinked layer and thereby swell resulting in formation of a film insoluble in water or alkali.
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申请公布号 |
US2006246380(A1) |
申请公布日期 |
2006.11.02 |
申请号 |
US20060354728 |
申请日期 |
2006.02.15 |
申请人 |
RENESAS TECHNOLOGY CORP. |
发明人 |
TERAI MAMORU;TOYOSHIMA TOSHIYUKI;ISHIBASHI TAKEO;TARUTANI SHINJI |
分类号 |
G03C5/00;G03F7/20;G03F7/40;H01L21/312 |
主分类号 |
G03C5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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