发明名称 Micropattern forming material and method for forming micropattern
摘要 A micropattern forming material is formed on a resist pattern containing an acidic group. The micropattern forming material comprises a compound that penetrates the resist pattern. The penetration of the compound causes the resist pattern to form a crosslinked layer and thereby swell resulting in formation of a film insoluble in water or alkali.
申请公布号 US2006246380(A1) 申请公布日期 2006.11.02
申请号 US20060354728 申请日期 2006.02.15
申请人 RENESAS TECHNOLOGY CORP. 发明人 TERAI MAMORU;TOYOSHIMA TOSHIYUKI;ISHIBASHI TAKEO;TARUTANI SHINJI
分类号 G03C5/00;G03F7/20;G03F7/40;H01L21/312 主分类号 G03C5/00
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