发明名称 METAL DEPOSITION FILM AND CAPACITOR USING IT
摘要 PROBLEM TO BE SOLVED: To provide a capacitor reduced in a failure rate in a manufacturing process of the capacitor and suited to the specification of miniaturization, and to provide a metal deposition film for capacitor used therefor. SOLUTION: In the metal deposition film having a metal deposition film that will become an electrode and a margin on at least one surface of a polymer molecule film, the margin includes Al oxide or Al hydroxide adhering thereto and silicone oil. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006303155(A) 申请公布日期 2006.11.02
申请号 JP20050122156 申请日期 2005.04.20
申请人 TORAY ADVANCED FILM CO LTD 发明人 UCHIDA TAKUSHI;TANAKA NORIO
分类号 H01G4/18;H01G4/015 主分类号 H01G4/18
代理机构 代理人
主权项
地址