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发明名称
Variable lens and exposure system
摘要
A lithography apparatus having variable lenses.
申请公布号
US2006245072(A1)
申请公布日期
2006.11.02
申请号
US20050106722
申请日期
2005.04.15
申请人
ASML NETHERLANDS B.V.
发明人
VENEMA WILLEM J.
分类号
G02B3/12
主分类号
G02B3/12
代理机构
代理人
主权项
地址
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