发明名称 |
System and method for inspecting wafers in a laser marking system |
摘要 |
An illumination system is disclosed for use in a semiconductor wafer back side inspection assembly. The illumination system includes an illumination source that is configured to direct illumination toward a highly reflective and directionally reflective surface at an angle alpha of about 45 degrees to about 75 degrees with respect to the surface.
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申请公布号 |
US2006244955(A1) |
申请公布日期 |
2006.11.02 |
申请号 |
US20050118192 |
申请日期 |
2005.04.29 |
申请人 |
SCHRAMM RAINER;EHRMANN JONATHAN |
发明人 |
SCHRAMM RAINER;EHRMANN JONATHAN |
分类号 |
G01N21/00 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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