| 摘要 |
The present invention provides a manufacturing method for a trench capacitor having an isolation collar (10) in a substrate (1) which is electrically connected to a substrate (1) on a single side via a buried contact, comprising the steps of providing a trench (5) in said substrate (1) using a hard mask (2, 3) having a corresponding mask opening; providing a capacitor dielectric (30) in said trench (5) on the trench wall; providing a first metallic liner (40) on said capacitor dielectric (30) in said trench (5) on said trench wall; providing a first conductive filling (20) in said trench (5) and etching back said conductive filling (20) within said trench (5); etching back said capacitor dielectric (30) and said first metallic liner (40) within said trench (5) to at least the upper surface of the etched-back first conductive filling (20); providing an isolation collar (10) in said trench (5) above said capacitor dielectric (30), above said first metallic liner (40) and above said etched-back first conductive filling (20); etching back said first conductive filling (20) within said trench (5) to below the lower side of the isolation collar (10); providing a metallic region (50; 50') within said trench (5) in electrical contact with said first metallic liner (40) and etching back said metallic region (50; 50') within said trench (5) to below the upper side of the isolation collar (10); etching back said isolation collar (10) to below said upper side (OS) of the substrate (1) and to above the upper side of the etched-back metallic region (50; 50'); and providing a single-siding isolation region (IS) and a single-sided contact region (KS) to said substrate (1) by partly removing a second conductive filling (70) in electrical contact with said etched-back metallic region (50; 50').
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