NOVEL RUTHENIUM-BASED MATERIALS AND RUTHENIUM ALLOYS, THEIR USE IN VAPOR DEPOSITION OR ATOMIC LAYER DEPOSITION AND FILMS PRODUCED THEREFROM

摘要

An alloy for use in vapor deposition or atomic layer deposition is described herein that includes ruthenium and at least one element from group IV, V or VI of the Periodic Chart of the Elements or a combination thereof. In addition, a layered material is described herein that comprises at least one layer that includes a ruthenium-based material or ruthenium-based alloy and at least one layer that includes at least one element from group IV, V or VI of the Periodic Chart of the Elements or a combination thereof.