发明名称 IMPRINT LITHOGRAPHY
摘要 PROBLEM TO BE SOLVED: To provide an imprint template configured to make an imprint on an imprintable medium in an imprint lithography process. SOLUTION: The imprint template has a pattern with a pattern density corresponding to a volume of an imprintable medium used to substantially fill pattern features per unit area of the contact face of the imprint template, wherein contiguous regions in the pattern on the contact face of the imprint template have substantially the same pattern density, have a minimized difference of pattern densities, or have a pattern density difference kept smaller than a maximum limit. Furthermore, the contiguous regions individually exhibit different functions after being imprinted on a substrate. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006303503(A) 申请公布日期 2006.11.02
申请号 JP20060114638 申请日期 2006.04.18
申请人 ASML NETHERLANDS BV;KONINKL PHILIPS ELECTRONICS NV 发明人 MEIJER PETER BARTUS L;KOLESNYCHENKO ALEKSEY Y
分类号 H01L21/027;B81C99/00 主分类号 H01L21/027
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