发明名称 Termoelectric heating and cooling apparatus for semiconductor processing
摘要 A thermoelectric wafer chuck is disclosed. The thermoelectric wafer chuck includes a wafer support surface for supporting a wafer; and a thermoelectric module provided in thermal contact with the wafer support surface for heating and/or cooling the wafer support surface and wafer.
申请公布号 US2006242967(A1) 申请公布日期 2006.11.02
申请号 US20050119218 申请日期 2005.04.28
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIN YU-LIANG;LIN CHIN-HSIEN;HWANG JERRY
分类号 F25B21/02 主分类号 F25B21/02
代理机构 代理人
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