| 摘要 |
A device for adjusting the illumination dose on a photosensitive layer in a microlithographic projection exposure apparatus has a plurality of stop elements which are, in a direction perpendicularly to a scanning direction of the apparatus, arranged next to one another. Each stop element has an outer surface that absorbs substantially all projection light impinging thereon, and a substantially rectangular circumference. Each stop element furthermore has at least one recess in its circumference or at least one opening through which projection light is allowed to pass. A drive unit individually displaces the stop elements along the scanning direction into a light field.
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